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Hydroxyl Radical Etching Improves Adhesion of Plasma‐Deposited a‐SiOxCyHz Films on Poly(Methylmethacrylate)

Abstract

Plasma‐deposited thin films comprising a‐SiOxCyHz with some organic content are of considerable interest as protective coatings. Their application has, however, been hampered by marginal adhesion and durability on some substrates. This study found that optimal adhesion was achieved with plasma pre‐treatments utilising vapours from the alcohol family. Our data show that rapid initial etching of the substrate occurs, probably by action of hydroxyl radicals, followed by deposition of a layer some 10 nm thick which appears to provide a surface capable of strong interfacial bonding with a subsequently deposited a‐SiOxCyHz layer. Compared with non‐depositing plasma pre‐treatments, such dual action provides stronger adhesion on PMMA. This opens up new possibilities for applying protective hard coatings on PMMA.

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Plasma pre‐treatments affect the adhesion of microwave plasma deposited a‐SiOxCyHzcoatings on PMMA. Significant improvement in adhesion is observed with alcohol plasma pre‐treatments, where QCM and XPS data revealed the dual phenomena of initial etching of PMMA followed by post‐plasma deposition of a thin alcohol plasma polymer layer, which appears to serve as a compatibilising layer.

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Authors:   Hall, Colin J.; Murphy, Peter J.; Griesser, Hans J.
Journal:   Plasma Processes and Polymers
Volume:   9
Issue:   4
Year:   2012
Pages:   398
DOI:   10.1002/ppap.201100159
Publication date:   01-04-2012

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