My watch list
my.chemeurope.com  
Login  

Combinatorial Magnetron Sputtering

Summary

Combinatorial Magnetron Sputtering is a process where large numbers of chemically distinct thin film samples can be made in a single deposition. Utilizing a multiple cathode sputter system manufactured by the Kurt J. Lesker Company, researchers at the California Institute of Technology have developed a process which enables them to make 5,000 unique compositions on one 4″ wafer in one deposition. Compositional control is achieved by varying the tilt angle of the cathodes and Z‐distance relative to the substrate. In addition to this extraordinary fabrication capability, the group also developed a model which can predict the range of future compositions as well as a rapid characterization technique which can sort through thousands of compositions in a 24 hour period.

Zusammenfassung

Kombinatorische Magnetronsputtern – Fortschritte mittels neuer Geräte und prädiktiver Techniken

Das kombinatorische Magnetronsputtern gestattet die Abscheidung einer großen Anzahl von Schichten in einem einzigen Depositionsschritt. Mittels Anpassung eines Mehrkathoden‐Sputtersystems der Kurt J. Lesker Company, gelang Wissenschaftlern vom California Institute of Technology die Abscheidung von 5000 einzelnen Verbindungen auf einem 4 Zoll Wafer in einem einzigen Prozessschritt. Ein Modell zur Voraussage der Variationsbreite zukünftiger Schichten und eine Technik zur schnellen Charakterisierung der Verbindungen wurden entwickelt.

Authors:   J. R. Gaines
Journal:   Vakuum in Forschung und Praxis
Volume:   29
edition:   5
Year:   2017
Pages:   26
DOI:   10.1002/vipr.201700660
Publication date:   04-Oct-2017
Facts, background information, dossiers
More about Wiley
Your browser is not current. Microsoft Internet Explorer 6.0 does not support some functions on Chemie.DE