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Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water

The need for the conformal deposition of TiO2 thin films in device fabrication has motivated a search for thermally robust titania precursors with noncorrosive byproducts. Alkylamido-cyclopentadienyl precursors are attractive because they are readily oxidized, yet stable, and afford environmentally mild byproducts. We have explored the deposition of TiO2 films on OH-terminated SiO2 surfaces by in situ Fourier transform infrared spectroscopy using a novel titanium precursor [(EtCp)Ti(NMe2)3 (1), Et = CH2CH3] with either ozone or water. This precursor initially reacts with surface hydroxyl groups at ≥150 °C through the loss of its NMe2 groups. However, once the precursor is chemisorbed, its subsequent reactivities toward ozone and water are very different. There is a clear reaction with ozone, characterized by the formation of monodentate formate and/or chelate bidentate carbonate surface species; in contrast, there is no detectable reaction with water. For the ozone-based ALD process, the surface formate/c...

Authors:   Joseph P. Klesko; Rezwanur Rahman; Aaron Dangerfield; Charith E. Nanayakkara; Thomas L’Esperance; Daniel F. Moser; L. Fabián Peña; Eric C. Mattson; Charles L. Dezelah; Ravindra K. Kanjolia; Yves J. Chabal
Journal:   Chemistry of Materials
Year:   2018
DOI:   10.1021/acs.chemmater.7b04790
Publication date:   16-Jan-2018
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