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Initial stage of atomic layer deposition of 2D-MoS2 on SiO2 surface: a DFT study

In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as co-reagent on the SiO2(0001) surface by means of density functional theory (DFT). All dominant reaction pathways from early stage of adsorption of each AL

Authors:   Mahdi Shirazi; Wilhelmus Kessels; Ageeth A. Bol
Journal:   Physical Chemistry Chemical Physics
DOI:   10.1039/C8CP00210J
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