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Investigation of Fine-Dispersion Silicon Nitride and Oxinitride Powders Manufactured by Titanium–Magnesium Production Waste Nitriding

The nitriding of titanium–magnesium production waste containing chlorine was studied using X-ray, IR, EPR, and EPMA techniques as well as chemical and mass spectrometry analyses. It was established that the high-dispersion system, consisting mainly of silicon nitride and oxinitride, formed in the temperature range of 1273–1673 K. The complex defective structure of initial silicon particles and their size determine the mechanism of nitriding and phase composition of the product formed. The base of this mechanism is the formation of free Si— and Si— bonds.

  • Content Type Journal Article
  • Pages 151-157
  • DOI 10.1023/A:1021865112564
  • Authors
    • M. V. Vlasova
    • V. A. Lavrenko
    • L. D. Dyubova
    • T. V. Tomila
    • L. P. Isayeva
    • V. P. Smirnov
    • Journal Journal of Materials Synthesis and Processing
    • Online ISSN 1573-4870
    • Print ISSN 1064-7562
    • Journal Volume Volume 7
    • Journal Issue Volume 7, Number 3

Authors:   M. V. Vlasova, V. A. Lavrenko, L. D. Dyubova, T. V. Tomila, L. P. Isayeva, V. P. Smirnov
Journal:   Journal of Materials Synthesis and Processing
Year:   2004
DOI:   10.1023/A:1021865112564
Publication date:   03-Nov-2004
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