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Nanotextured crystalline silicon solar cells

Abstract

Nano‐scale textures are formed on crystalline silicon surfaces by using a two‐step electroless wet‐chemical method consisting of a treatment in an activated Na2S2O8 (K2S2O8) solution for localized oxidation/surface reaction and silver nanoparticles deposition. The oxidation/reaction products are etched in an aqueous solution of HF and H2O2 assisted by the presence of silver nanoparticles. The reflectance of the nanotextured silicon wafer surfaces less than 5% in the spectral interval 300–900 nm is observed. It was found that the surface texture can withstand without significantly changing the high‐temperature solar cell processing. A weighted reflectance of 9.5% and 16.43% efficiency are obtained on nanotextured mc‐Si solar cells with an active area of 146 mm2 prepared using the standard screen‐printing technique.

Authors:   Dimitrov, Dimitre Z.; Lin, Ching‐Hsi; Du, Chen‐Hsun; Lan, Chung‐Wen
Journal:   physica status solidi (a)
Year:   2011
Pages:   n/a
DOI:   10.1002/pssa.201127150
Publication date:   29-Aug-2011
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