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Creation of nanoporous tantalum (Ta)-incorporated titanium (Ti) surface onto Ti implants by sputtering of Ta in Ar under extremely high negative substrate biases

The development of new surface modification techniques for improving the biological performances (i.e., osseointegration) and long-term stability of Ti implants is one of the most active research areas in dental and orthopedic implant industries. We herein propose a novel, simple way of creating nanoporous t

Authors:   Vuong-Hung Pham; Tae-Sik Jang; Hyun-Do Jung; Hyoun-Ee Kim; Young-Hag Koh
Journal:   Journal of Materials Chemistry
Volume:   22
edition:   47
Pages:   24798
DOI:   10.1039/C2JM35536A
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