Metal oxide coatings have a variety of applications in industrial processes. As some of them have bio‐sensitive properties there is growing interest for their use in medical applications as well. Thus, the development of suitable deposition techniques is of major importance for these purposes. From these techniques plasma deposition at atmospheric pressure offers a promising approach as there is no need for vacuum systems accompanied by lower costs, less process time, and easier integration into existing process chains. In order to optimize the coating process, a good knowledge of the plasma is needed. In this work, we present investigations on the plasma properties performed by systematic optical emission spectroscopy (OES) measurements.
Systematic optical emission spectroscopy measurements of a non‐thermal atmospheric pressure DC plasma have been performed in order to get insight into the different species in the plasma. The plasma was ignited in pure nitrogen, while copper was introduced via a target electrode. This work is a first step towards a thorough understanding of this special type of copper containing nitrogen plasma at atmospheric pressure for the deposition of copper oxide films.