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Optimization of PVD Parameters for the Deposition of Ultrahard Ti–Si–B–N Coatings

03-Nov-2004 | D. V. Shtansky, E. A. Levashov, A. N. Sheveiko, J. J. Moore, Journal of Materials Synthesis and Processing, 2004

Multicomponent Ti–Si–B–N coatings were deposited on high-speed steel (HSS) substrates by reactive magnetron sputtering using a SHS TiB + 20 wt% Si target. The influences of the substrate temperature, bias voltage, and nitrogen partial pressure on the structure and the elemental compositions of ...

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