My watch list
my.chemeurope.com  
Login  

Harold M. Manasevit



Dr. Harold M. Manasevit ( - ) is an American materials scientist.

Additional recommended knowledge

Manasevit received a B.S. Degree in Chemistry from Ohio University in 1950, M.S. in Chemistry from Pennsylvania State University in 1951, and Ph.D. in Physical Inorganic Chemistry from the Illinois Institute of Technology in 1959. He then joined the U.S. Borax Research Corp. in Anaheim, California, but in 1960 left for the North American Aviation Company. In 1983 he joined TRW as Senior Scientist.

Manasevit's career has focused on Chemical Vapor Deposition (CVD) of materials. In 1963 he was the first to document epitaxial growth of silicon on sapphire, and in 1968 was the first to publish on metalorganic chemical vapor deposition (MOCVD) for the epitaxial growth of GaAs. He has developed numerous CVD techniques for etching insulators and for producing semiconductor and superconducting films on insulators.

Manesevit holds 16 patents, and was awarded the 1985 IEEE Morris N. Liebmann Memorial Award "for pioneering work in metalorganic chemical vapor deposition, epitaxial-crystal reactor design, and demonstration of superior quality semiconductor devices grown by this process."

References

  • Robert S. Feigelson (ed), 50 Years Progress in Crystal Growth: A Reprint Collection, Elsevier, 2004, page xxviii. ISBN 0444516506.
  • Smithsonian MIND Repository entry
 
This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "Harold_M._Manasevit". A list of authors is available in Wikipedia.
Your browser is not current. Microsoft Internet Explorer 6.0 does not support some functions on Chemie.DE