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Wetting layer



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In the creation of quantum dots with a molecular beam epitaxy chamber, by spraying a surface with layers of atoms under high temperature, a residue is produced on the surface called a wetting layer, which can interfere with the stimulation of the dots in order to control their state for quantum computation.

 
This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "Wetting_layer". A list of authors is available in Wikipedia.
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