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Mask set

A mask set is a series of electronic data that define geometry for the photolithography steps of semiconductor fabrication. Each of the physical masks generated from this data are called a photomask.

A mask set for a modern process typically contains as many as twenty or more masks, each of which defines a specific photolithographic step in the semiconductor fabrication process. Examples of masks include:

  • p-well
  • n-well
  • active
  • poly
  • p-select
  • n-select
  • contact
  • metal1, 2, 3...

For more information, see photolithography and semiconductor manufacturing.

This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "Mask_set". A list of authors is available in Wikipedia.
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