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Niemeyer-Dolan technique



 

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The Niemeyer-Dolan technique, also called Dolan technique or shadow evaporation technique (the term preferred by its inventor, J. Niemeyer), is a lithographic method to create nanometer-sized overlapping structures comprised of two or more materials.

A shadow mask for oblique angle evaporation is created on the substrate. Depending on the evaporation angle the shadow image of the mask is projected onto different positions on the substrate. By carefully choosing an individual angle for each material to be deposited, adjacent openings in the mask can be projected on the same spot, creating an overlay of different materials.

 
This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "Niemeyer-Dolan_technique". A list of authors is available in Wikipedia.
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