Atomic Layer Deposition

Companies Atomic Layer Deposition

SALD BV, Netherlands

SALD is a spin-off from SoLayTec, which developed and sold advanced Spatial ALD machines for the mass production of solar panels, mainly to China. Therefore, SALD has in-depth expertise in Spatial ALD technology, combined with the unique ability to transfer it from lab to fab. To realize the great o more

Forge Nano Inc., USA

Forge Nano is a global leader in precision ALD nano-coating technology, driving improvement on a daily basis to create innovative materials solutions and more efficient, sustainable products. more

News Atomic Layer Deposition

• New chemistry for ultra-thin gas sensors
  

  The application of zinc oxide layers in industry is manifold and ranges from the protection of degradable goods to the detection of toxic nitrogen oxide gas. Such layers can be deposited by atomic layer deposition (ALD) which employs typically chemical compounds, or simply precursors, which ignite i more

• A cheaper way to scale up atomic layer deposition
  

  Atomic layer deposition (ALD) involves stacking layers of atoms on top of each other like pancakes. The atoms come from a vaporized material called a precursor. ALD is a well-established technique for manufacturing microelectronics like semiconductors and magnetic heads for sound recording, as well more

• Volkswagen invests in US start-up Forge Nano
  

  The Volkswagen Group is investing US$10 million in the startup “Forge Nano Inc.” with a view to reinforcing its specialist knowledge in the field of battery research. Forge Nano is investigating a material coating technology that could further improve the performance of battery materials. As a partn more

White papers Atomic Layer Deposition

• Applications of Quadrupole Mass Spectrometry for Atomic Layer Deposition
  

  Guidance for the use of Quadrupole Mass Spectrometry (QMS) Systems for ALD process and equipment optimization more

Publications Atomic Layer Deposition

• Sensors, Vol. 18, Pages 1813: An Overview of High-k Oxides on Hydrogenated-Diamond for Metal-Oxide-Semiconductor Capacitors and Field-Effect Transistors

  Sensors, Vol. 18, Pages 1813: An Overview of High-k Oxides on Hydrogenated-Diamond for Metal-Oxide-Semiconductor Capacitors and Field-Effect Transistors Sensors doi: 10.3390/s18061813 Authors: Jiangwei Liu Yasuo Koide Thanks to its excellent intrinsic properties, diamond is promisin more

• Initial stage of atomic layer deposition of 2D-MoS2 on SiO2 surface: a DFT study

  In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as co-reagent on the SiO2(0001) surface by means of density functional theory (DFT). All dominant reaction pathways from early stage of adsorption o more

• Hydrogenolysis of 5-hydroxymethylfurfural to 2,5-dimethylfuran over supported Pt-Co bimetallic catalysts under mild conditions

  Highly dispersed Pt-Co bimetallic catalysts were deposited on multi-walled carbon nanotubes (MWCNTs) by atomic layer deposition. High-resolution TEM and TPR analysis verified the formation of Pt-Co bimetallic particles. Catalysts were applied for hydrogenolysis of 5-hydroxymethyfurfural (HMF) to 2,5 more