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800 nanometer

CMOS manufacturing
processes

10 µm
3 µm
1.5 µm
1 µm
800 nm (0.80 µm)
600 nm (0.60 µm)
350 nm (0.35 µm)
250 nm (0.25 µm)
180 nm (0.18 µm)
130 nm (0.13 µm)
90 nm
65 nm
45 nm
32 nm
22 nm
16 nm

The 800 nanometer (800 nm or 0.8 µm) process refers to the level of semiconductor process technology that was reached in the 1989-1990 timeframe, by most leading semiconductor companies, like Intel and IBM.

Products featuring 0.8 µm manufacturing process

Intel 486 CPU launched in 1989 was manufactured using this process.

Additional recommended knowledge

Essential Laboratory Skills Guide

What is the Correct Way to Check Repeatability in Balances?

Daily Sensitivity Test

Preceded by 1 µm	CMOS manufacturing processes	Succeeded by 600 nm

Categories: Condensed matter physics | International Technology Roadmap for Semiconductors lithography nodes

This article is licensed under the GNU Free Documentation License. It uses material from the Wikipedia article "800_nanometer". A list of authors is available in Wikipedia.

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