Picosun and NCTU launch industrial Atomic Layer Deposition facility

24-Mar-2015 - Taiwan

National Chiao Tung University (NCTU) and Picosun Oy establish a Joint Industrial atomic layer deposition (ALD) Research Laboratory at the premises of X-Photonics Interdisciplinary Center at NCTU to enable the next generation of micro- and optoelectronics using ALD technology.

With this collaboration NCTU and Picosun will develop a wide range of interdisciplinary technology solutions for applications such as microelectronic devices for 7 nm technology node, high-brightness light emitting diodes (HBLED), and high electron mobility transistors (HEMT). Both fundamental research and advanced device fabrication for industrial applications will be the core objectives of the Joint Industrial ALD Research Laboratory.

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