DuPont Technologies and Shipley, a wholly owned subsidiary of Rohm and Haas
Company, today announced that they have signed a joint development
agreement to produce fully formulated 157 nanometer photoresists and
anti-reflective coatings which will be used to make future generations of
semiconductor chips. Details of the agreement were not disclosed.
The companies expect to bring this technology to market by 2003.
As part of the agreement, Shipley becomes the first licensee of DuPont
proprietary fluoropolymer binder resin technology, one of the critical
ingredients in leading-edge products for micro-lithography. Both companies
are actively seeking semiconductor device manufacturing partners to
support this development effort.
The agreement will allow the companies to take a step closer to
commercializing products that extend Moore's Law, which states that the
number of transistors on a computer chip doubles every 12 to 18 months,
thus increasing manufacturing productivity and chip performance. Today's
most advanced chips have features as small as 130 nanometers. To
reduce the feature size to 70 nanometers, which would more than triple the
number of transistors on a chip, requires a new form of micro-lithography at
157 nanometer wavelength, including new photoresists and anti-reflective
coatings. Seventy nanometers is approximately one thousandth the
diameter of a typical human hair.
"We are very pleased to have Shipley as the first licensee for our proprietary
technology," said John C. Hodgson, group vice president and general
manager DuPont i Technologies. "DuPont has pioneered the development
and production of leading-edge photopolymers and fluoropolymers and,
coupled with Shipley's expertise in developing and manufacturing
photoresists, this latest breakthrough will provide the enabling technology to
extend Moore's Law for the next generation of faster, more powerful
"DuPont iTechnologies will be a wonderful partner on this project," said
Stephen Robinson, president of Shipley Microelectronics and vice president
of Rohm and Haas Company. "DuPont fluoropolymer technology is unique
and well-known within the industry. We believe it is a perfect fit with our
photoresist technology expertise."