New Gas Purification Technology From Pall Corporation
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East Hills, NY (July 22, 2002) - A new gas purification material has been developed by Pall Corporation to remove damaging impurities from gas phase processes. As the complexity of semiconductor devices increases, a greater emphasis is placed on the removal of molecular contamination. The AresKleen (TM) purification material combines reactive groups on an inorganic substrate with Pall's proven Ultramet-L (R) filter technology to capture and remove impurities including O2, H2O, CO2, CO, THC and particulates. The advanced material is compatible with a wide variety of inert gases.
The AresKleen material is now available in Pall's family of Gaskleen (R) purifiers for point-of-use gas purification. These products offer sub-ppb level purification at flow rates from 1 slpm to 50 slpm at pressures of 750 psig up to 3000 psig while providing 0.003 micron filtration. The entire family of Gaskleen filters is designed with electropolished 316L stainless steel components and exhibit superior pressure drop characteristics. Pall's point-of -use purifiers produce unsurpassed single pass gas purity levels.
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